ASML high-NA EUV tool slots become a board item for U.S. chip startups
The waiting list for the next lithography generation is now long enough that directors, not just process engineers, are asking for the Gantt chart.
James WhitakerTechnology Editor
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WILTON, Conn. — The waiting list for the next lithography generation is now long enough that directors, not just process engineers, are asking for the Gantt chart.
Two well-funded U.S. logic startups said they have been told not to model high-NA capacity before 2028 without a foundry letter that does not yet exist.
James Whitaker
Technology Editor
Reports on semiconductors, cloud infrastructure, and the industrial politics of AI.